COATINGS OF PYROCARBON AND SILICON-CARBIDE BY CHEMICAL VAPOR-DEPOSITION

被引：0

作者：

VOICE, EH ^{[1
]}

机构：

[1] ATOM ENERGY ESTAB,DRAGON PROJECT OFF,WINFRITH,DORCHESTER,DORSETSHIRE,ENGLAND

来源：

CHEMICAL ENGINEER-LONDON | 1974年 / 292期

关键词：

D O I：

暂无

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

引用

页码：785 / 792

页数：8

共 50 条

[1] CHEMICAL VAPOR-DEPOSITION OF SILICON-CARBIDE
SCHLICHTING, J
[J]. POWDER METALLURGY INTERNATIONAL, 1980, 12 (03): : 141 - 147
[2] GROWTH OF SILICON-CARBIDE BY CHEMICAL VAPOR-DEPOSITION
CHOI, BJ
KIM, DR
[J]. JOURNAL OF MATERIALS SCIENCE LETTERS, 1991, 10 (14) : 860 - 862
[3] A MODEL OF SILICON-CARBIDE CHEMICAL VAPOR-DEPOSITION
ALLENDORF, MD
KEE, RJ
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1991, 138 (03) : 841 - 852
[4] THERMODYNAMIC CALCULATIONS FOR THE CHEMICAL VAPOR-DEPOSITION OF SILICON-CARBIDE
KINGON, AI
LUTZ, LJ
LIAW, P
DAVIS, RF
[J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1983, 66 (08) : 558 - 566
[5] CHEMICAL VAPOR-DEPOSITION OF SILICON-CARBIDE AND ITS APPLICATIONS
BRUTSCH, R
[J]. THIN SOLID FILMS, 1985, 126 (3-4) : 313 - 318
[6] CHEMICAL VAPOR-DEPOSITION OF SILICON-CARBIDE .13.
SCHLICHTING, J
[J]. POWDER METALLURGY INTERNATIONAL, 1980, 12 (04): : 196 - 200
[7] CHEMICAL VAPOR-DEPOSITION OF SILICON-CARBIDE FOR LARGE AREA MIRRORS
GENTILMAN, RL
MAGUIRE, EA
[J]. PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1981, 315 : 131 - 134
[8] SURFACE STUDIES RELEVANT TO SILICON-CARBIDE CHEMICAL VAPOR-DEPOSITION
STINESPRING, CD
WORMHOUDT, JC
[J]. JOURNAL OF APPLIED PHYSICS, 1989, 65 (04) : 1733 - 1742
[9] A CHEMICAL VAPOR-DEPOSITION METHOD FOR THE MANUFACTURE OF SILICON-CARBIDE TUBES
ZHAO, GY
ZHU, CW
REVANKAR, V
HLAVACEK, V
[J]. JOURNAL OF ALLOYS AND COMPOUNDS, 1992, 184 (02) : 219 - 233
[10] EPITAXIAL NUCLEATION OF POLYCRYSTALLINE SILICON-CARBIDE DURING CHEMICAL VAPOR-DEPOSITION
SHELDON, BW
BESMANN, TM
MORE, KL
MOSS, TS
[J]. JOURNAL OF MATERIALS RESEARCH, 1993, 8 (05) : 1086 - 1092

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