INFLUENCE OF HEAT-TREATMENT ON INTERACTION OF NICKEL ATOMS WITH OXYGEN IN SILICON

被引：0

作者：

BAKHADYRKHANOV, MK ^{[1
]}

ZAINOBIDINOV, S ^{[1
]}

TESHABAEV, AT ^{[1
]}

KHODZHAEVA, MA ^{[1
]}

机构：

[1] VI LENIN STATE UNIV,TASHKENT,UZSSR

来源：

SOVIET PHYSICS SEMICONDUCTORS-USSR | 1976年 / 10卷 / 05期

关键词：

D O I：

暂无

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

引用

页码：593 / 594

页数：2

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