DYNAMICS OF DEFECT CREATION BY ION-IMPLANTATION IN THERMAL SIO2

被引：24
|
作者：
DEVINE, RAB
GOLANSKI, A
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1984年 / 55卷 / 07期
关键词：
D O I：
10.1063/1.333278
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：2738 / 2740
页数：3
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