GAS EXPOSURE TESTS OF HIGH-FIELD NIOBIUM X-BAND CAVITIES

被引：5
|
作者：
SCHNITZKE, K [1 ]
MARTENS, H [1 ]
HILLENBRAND, B [1 ]
DIEPERS, H [1 ]
机构：
[1] SIEMENS AG, RES LABS, D-8520 ERLANGEN, WEST GERMANY
来源：
APPLIED PHYSICS | 1974年 / 5卷 / 01期
关键词：
D O I：
10.1007/BF01193400
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：77 / 78
页数：2
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