DIAMOND-LIKE CARBON THIN-FILM DEPOSITION USING A MAGNETICALLY CONFINED RF PECVD SYSTEM

Diamond-like carbon thin films have been deposited at low temperatures, using local magnetic confinement in a r.f.-powered plasma-enhanced chemical vapour deposition process. The increased plasma density and temperature obtained by magnetically confining the plasma, increases the ionization of the hydrocarbon gas in the deposition chamber. The modified plasma is characterized together with the material properties of the deposited films. A model is proposed to explain the dissociation of species in the plasma and the plasma temperature based on the observed results. Doping of the films using nitrogen gas fed in with the hydrocarbon is also investigated.