A COMPARATIVE-STUDY ON THE ELECTRICAL-PROPERTIES OF AMORPHOUS-SILICON THIN-FILMS IN LIGHT-INDUCED CRYSTALLIZATION

被引：1
|
作者：
CHEN, ZM
EBIHARA, K
JOHN, PK
TONG, BY
WONG, SK
机构：
[1] UNIV WESTERN ONTARIO,DEPT PHYS,LONDON N6A 3K7,ONTARIO,CANADA
[2] UNIV WESTERN ONTARIO,DEPT CHEM,LONDON N6A 3K7,ONTARIO,CANADA
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1984年 / 23卷 / 10期
关键词：
D O I：
10.1143/JJAP.23.L761
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：L761 / L764
页数：4
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