THERMOCHEMICAL MODELING OF VAPOR-DEPOSITION

被引：0
|
作者：
BERNARD, C
机构：
来源：
HIGH TEMPERATURE SCIENCE | 1989年 / 27卷
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D O I：
暂无
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
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页码：131 / 142
页数：12
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