PHOTOCONDUCTION AND TRAPPING IN SPUTTERED TANTALUM OXIDE FILMS

被引：22

|

作者：

ULLMAN, FG

机构：

来源：

JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS | 1967年 / 28卷 / 02期

关键词：

D O I：

10.1016/0022-3697(67)90122-9

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

收藏

页码：279 / &

相关论文

共 50 条

[31] Heat treatment induced structural and optical properties of rf magnetron sputtered tantalum oxide films
Chandra, S. V. Jagadeesh
Rao, G. Mohan
Uthanna, S.
CRYSTAL RESEARCH AND TECHNOLOGY, 2007, 42 (03) : 290 - 294
[32] PROPERTIES OF PLANAR-MAGNETRON-SPUTTERED TANTALUM FILMS
ROTTERSMAN, MH
BILL, MJ
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 319 - 319
[33] INFLUENCE OF CONDUCTING UNDERLAYS ON PROPERTIES OF SPUTTERED TANTALUM FILMS
WESTWOOD, WD
THIN SOLID FILMS, 1970, 6 (05) : 307 - &
[34] VARIATION WITH DEPT OF ELECTRICAL PROPERTIES OF SPUTTERED TANTALUM FILMS
WATERHOU.N
JOURNAL OF APPLIED PHYSICS, 1972, 43 (04) : 1498 - &
[35] PROPERTIES OF ANODIC FILMS FORMED ON REACTIVELY SPUTTERED TANTALUM
GERSTENBERG, D
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1966, 113 (06) : 542 - +
[36] STRUCTURE AND PROPERTIES OF RF SPUTTERED, SUPERCONDUCTING TANTALUM FILMS
SCHREY, F
MATHIS, RD
PAYNE, RT
MURR, LE
THIN SOLID FILMS, 1970, 5 (01) : 29 - &
[37] PROPERTIES OF PLANAR-MAGNETRON-SPUTTERED TANTALUM FILMS
ROTTERSMAN, MH
BILL, MJ
THIN SOLID FILMS, 1979, 61 (03) : 281 - 288
[38] ROLE OF SURFACE HYDROXYLS IN NUCLEATION OF SPUTTERED TANTALUM FILMS
FEINSTEIN, LG
HUTTEMANN, RD
THIN SOLID FILMS, 1972, 12 (02) : S47 - +
[39] EFFECTS OF ARGON PRESSURE ON PROPERTIES OF SPUTTERED TANTALUM FILMS
WESTWOOD, WD
BOYNTON, RJ
WILCOX, PS
THIN SOLID FILMS, 1973, 16 (01) : 1 - 25
[40] INVESTIGATION OF SPUTTERED BETA-TANTALUM THIN FILMS
COOK, HC
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1967, 4 (02): : 80 - &

← 1 2 3 4 5 →