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- [43] Fluorinated materials for 157 nm lithography ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XX, PTS 1 AND 2, 2003, 5039 : 533 - 538
- [44] Optical materials and coatings at 157 nm EMERGING LITHOGRAPHIC TECHNOLOGIES III, PTS 1 AND 2, 1999, 3676 : 342 - 349
- [45] Masking materials for 157 nm lithography 19TH ANNUAL SYMPOSIUM ON PHOTOMASK TECHNOLOGY, PTS 1 AND 2, 1999, 3873 : 412 - 420
- [47] Swiss contributions to problems of strength and toughness of materials (of cheese- and chocolate-specimens in fracture mechanics) FRACTURE RESEARCH IN RETROSPECT: AN ANNIVERSARY VOLUME IN HONOUR OF GEORGE R. IRWIN'S 90TH BIRTHDAY, 1997, : 507 - 533