CHEMICALLY SENSITIVE INTERFACES ON SURFACE-ACOUSTIC-WAVE DEVICES

被引:0
|
作者
RICCO, AJ
CROOKS, RM
XU, CJ
AURED, RE
机构
[1] TEXAS A&M UNIV, COLLEGE STN, TX 77843 USA
[2] ADHERENT TECHNOL INC, ALBUQUERQUE, NM 87123 USA
来源
关键词
D O I
暂无
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Using surface acoustic wave (SAW) devices, three approaches to the effective use of chemically sensitive interfaces that are not highly chemically selective have been examined: (1) molecular identification from time-resolved permeation transients; (2) using multifrequency SAW devices to determine the frequency dependence of analyte/film interactions; (3) use of an array of SAW devices bearing diverse chemically sensitive interfaces to produce a distinct response pattern for each analyte. In addition to their well-known sensitivity to mass changes (0.0035 monolayer of N-2 can be measured), SAW devices respond to the mechanical and electronic properties of thin films, enhancing response information content but making a thorough understanding of the perturbation critical. Simultaneous measurement of changes in frequency and attenuation, which can provide the information necessary to determine the type of perturbation, are used as part of the above discrimination schemes.
引用
收藏
页码:264 / 279
页数:16
相关论文
共 50 条