FIELD AND HALL-EFFECTS IN SEMICONDUCTING YBA2CU3O6+DELTA

被引:9
|
作者
LEVY, A
FALCK, JP
KASTNER, MA
BIRGENEAU, RJ
FIORY, AT
HEBARD, AF
GALLAGHER, WJ
KLEINSASSER, AW
ANDERSON, AC
机构
[1] AT&T BELL LABS,MURRAY HILL,NJ 07974
[2] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
[3] LINCOLN LABS,LEXINGTON,MA 02173
来源
PHYSICAL REVIEW B | 1992年 / 46卷 / 01期
关键词
D O I
10.1103/PhysRevB.46.520
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The field-effect mobility, Hall coefficient, and conductivity as functions of the oxygen concentration and temperature are reported for YBa2Cu3O6+delta films on the insulating side of the insulator-to-metal transition. The temperature dependence of the conductivity and Hall coefficient indicate that for small-delta the excess oxygen introduces acceptor states at about 30 meV above the valence-band edge. The field effect reveals a space-charge layer in which carriers are depleted at the air-YBa2Cu3O6+delta interface. The size of the field effect is limited by localized states at the interface.
引用
收藏
页码:520 / 523
页数:4
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