DIFFUSION OF ION-IMPLANTED SB IN SIO2

被引：13
|
作者：
VANOMMEN, AH
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1987年 / 61卷 / 03期
关键词：
D O I：
10.1063/1.338100
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：993 / 997
页数：5
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