CHEMICAL CONVERSION OF COMPOSITE FILMS ON SILICON BY ELECTRON-BEAM IRRADIATION - COMMENT

被引：2
|
作者：
HEIMANN, RB [1 ]
机构：
[1] MCMASTER UNIV,INST MAT RES,HAMILTON L8S 4M1,ONTARIO,CANADA
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1983年 / 1卷 / 01期
关键词：
D O I：
10.1116/1.582532
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：108 / 110
页数：3
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