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PROPERTIES OF RF-SPUTTERED BERYLLIUM THIN-FILMS
被引:2
|
作者
:
PAULSON, WM
论文数:
0
引用数:
0
h-index:
0
机构:
MOTOROLA INC,SEMICONDUCTOR RES & DEV LAB,PHOENIX,AZ 85001
MOTOROLA INC,SEMICONDUCTOR RES & DEV LAB,PHOENIX,AZ 85001
PAULSON, WM
[
1
]
LORIGAN, RP
论文数:
0
引用数:
0
h-index:
0
机构:
MOTOROLA INC,SEMICONDUCTOR RES & DEV LAB,PHOENIX,AZ 85001
MOTOROLA INC,SEMICONDUCTOR RES & DEV LAB,PHOENIX,AZ 85001
LORIGAN, RP
[
1
]
机构
:
[1]
MOTOROLA INC,SEMICONDUCTOR RES & DEV LAB,PHOENIX,AZ 85001
来源
:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY
|
1977年
/ 14卷
/ 01期
关键词
:
D O I
:
10.1116/1.569124
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:210 / 218
页数:9
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