PROPERTIES OF RF-SPUTTERED BERYLLIUM THIN-FILMS

被引：2
|
作者：
PAULSON, WM [1 ]
LORIGAN, RP [1 ]
机构：
[1] MOTOROLA INC,SEMICONDUCTOR RES & DEV LAB,PHOENIX,AZ 85001
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1977年 / 14卷 / 01期
关键词：
D O I：
10.1116/1.569124
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：210 / 218
页数：9
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