A SILICON-CONTAINING POSITIVE PHOTORESIST FOR A BILAYER RESIST SYSTEM

被引：0
|
作者：
SAOTOME, Y
GOKAN, H
SAIGO, K
SUZUKI, M
OHNISHI, Y
机构：
[1] NIPPON ELECT CO LTD,FUNDAMENTAL RES LABS,KAWASAKI 213,JAPAN
[2] NIPPON ELECT CO LTD,MICROELECTR RES LABS,KAWASAKI 213,JAPAN
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1984年 / 131卷 / 08期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C310 / C310
页数：1
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