MAGNETO-IMPEDANCE IN SPUTTERED AMORPHOUS FILMS FOR MICRO MAGNETIC SENSOR

被引:73
|
作者
UCHIYAMA, T
MOHRI, K
PANINA, LV
FURUNO, K
机构
[1] Nagoya University
关键词
D O I
10.1109/20.490321
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The magneto-impedance (MI) effect in RF sputtered (CoFe)(80)B-20 zero-magnetostrictive amorphous films are presented, The relation between annealing conditions and MI characteristics was investigated. Impedance Z monotonously decreased with increasing applied field Hex when a high frequency sinusoidal current was applied to the sample annealed in a rotational field. In case of the samples having transverse anisotropy, Z sharply increases with Hex for the region Hex < Hk (anisotropy field). MI ratio ((Delta\Zl/\Z(0)\/Oe) of 8%/Oe was obtained for the sample annealed in a dc field (or applying dc current) after annealing in the rotational field. The Colpitts oscillator type field sensor was constructed using the film element. A direction sensing utilizing the terrestrial field was carried out using the MI-colpitts sensor.
引用
收藏
页码:3182 / 3184
页数:3
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