LOW-TEMPERATURE INTERDIFFUSION BETWEEN ALUMINUM THIN-FILMS AND GAAS

被引：23
|
作者：
CHRISTOU, A [1 ]
DAY, HM [1 ]
机构：
[1] USN,RES LAB,WASHINGTON,DC 20375
来源：
JOURNAL OF APPLIED PHYSICS | 1976年 / 47卷 / 09期
关键词：
D O I：
10.1063/1.323294
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：4217 / 4219
页数：3
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