ACTION AND REACTION - CHEMISTRY AT SEMICONDUCTOR SURFACES

被引：0
|
作者：
BOLAND, JJ [1 ]
机构：
[1] IBM CORP,DIV RES,YORKTOWN HTS,NY 10598
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1993年 / 205卷
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D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
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页码：4 / COLL
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