PROBE-FORMING ELECTRON-BEAM SYSTEMS AS LITHOGRAPHIC TOOLS

被引：0
|
作者：
PFEIFFER, HC
LANGNER, GO
机构：
来源：
OPTIK | 1992年 / 92卷 / 02期
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暂无
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
The evolution of probe-forming electron-beam systems as micro- and nanofabrication tools is reviewed. Industrial applications of e-beam lithography have provided challenges and incentives for innovative new electron optics concepts. The state-of-the-art implementation of these new concepts at IBM and results achieved are the primary subject of this paper.
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页码：89 / 96
页数：8
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