ANISOTROPIC-PLASMA ETCHING OF SPUTTERED ZINC-OXIDE

被引：4

作者：

SWANSON, GD

TAMAGAWA, T

POLLA, DL

机构：

[1] Department of Electrical Engineering, University of Minnesota, Minneapolis

来源：

关键词：

D O I：

10.1149/1.2087111

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

[No abstract available]

引用

页码：2982 / 2984

页数：3

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