ANISOTROPIC-PLASMA ETCHING OF SPUTTERED ZINC-OXIDE

被引：4
|
作者：
SWANSON, GD
TAMAGAWA, T
POLLA, DL
机构：
[1] Department of Electrical Engineering, University of Minnesota, Minneapolis
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1990年 / 137卷 / 09期
关键词：
D O I：
10.1149/1.2087111
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
[No abstract available]
引用
收藏
页码：2982 / 2984
页数：3
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