EFFECT OF CU DEPOSITION ON STRUCTURAL AND ELECTRONIC-PROPERTIES OF CLEAVED SI(111) SURFACES

被引：24
|
作者：
TALEBIBRAHIMI, A
MERCIER, V
SEBENNE, CA
BOLMONT, D
CHEN, P
机构：
来源：
SURFACE SCIENCE | 1985年 / 152卷 / APR期
关键词：
D O I：
10.1016/0039-6028(85)90543-6
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
收藏
页码：1228 / 1238
页数：11
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