A COMPLETE DESCRIPTION OF THE DISPERSION-RELATION FOR THIN METAL-FILM PLASMON-POLARITONS

被引：27
|
作者：
BURTON, FA
CASSIDY, SA
机构：
[1] British Telecom Research Laboratories, Martlesham Heath, Ipswich, Suffolk
来源：
JOURNAL OF LIGHTWAVE TECHNOLOGY | 1990年 / 8卷 / 12期
关键词：
D O I：
10.1109/50.62881
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
A versatile numerical method is used to solve the plasmonpolariton dispersion relation for a planar thin metal film geometry. A complete description of the variation of effective-mode index and propagation length with metal thickness and cover index is presented for all four modes. The spatial distribution of these modes is calculated explicitly. The effect of a nonideal metal film and of dielectric loss in the cover material is considered.
引用
收藏
页码：1843 / 1849
页数：7
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