LASER WRITING ON A NOVEL BILAYER RESIST STRUCTURE

被引：0
|
作者：
KIN, L
OPRYSKO, MM
机构：
来源：
APPLIED PHYSICS LETTERS | 1985年 / 46卷 / 10期
关键词：
D O I：
暂无
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：997 / 999
页数：3
相关论文
共 50 条
  • [1] Novel silicon-containing negative resist for bilayer application in electron beam direct writing
    Hashimoto, Kazuhiko
    Endo, Masayuki
    Sasago, Masaru
    1600, (32):
  • [2] Novel silicon-containing negative resist for bilayer application in electron beam direct writing
    Hashimoto, Kazuhiko
    Endo, Masayuki
    Sasago, Masaru
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1993, 32 (07): : 3317 - 3320
  • [3] NOVEL SILICON-CONTAINING NEGATIVE RESIST FOR BILAYER APPLICATION IN ELECTRON-BEAM DIRECT WRITING
    HASHIMOTO, K
    ENDO, M
    SASAGO, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1993, 32 (07): : 3317 - 3320
  • [4] Novel materials for 157nm bilayer resist design
    Dilocker, S
    Malik, S
    De, B
    ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XX, PTS 1 AND 2, 2003, 5039 : 627 - 632
  • [5] Versatile bilayer resist for laser lithography at 405 nm on glass substrates
    Wang, Quandou
    Griesmann, Ulf
    OPTICAL ENGINEERING, 2013, 52 (10)
  • [6] A novel bilayer resist approach using radiation sensitive organometalics precursors
    Jeyakumar, A
    Barstow, SJ
    Henderson, CL
    ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XIX, PTS 1 AND 2, 2002, 4690 : 1034 - 1042
  • [7] INORGANIC RESIST FOR BILAYER APPLICATIONS
    YOSHIKAWA, A
    UTSUGI, Y
    ACS SYMPOSIUM SERIES, 1987, 346 : 309 - 316
  • [8] INORGANIC RESIST FOR BILAYER APPLICATIONS
    YOSHIKAWA, A
    UTSUGI, Y
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1986, 192 : 155 - PMSE
  • [9] Force and humidity dual sensors fabricated by laser writing on polyimide/paper bilayer structure for pulse and respiration monitoring
    Luo, Jiangjiang
    Yao, Yanbo
    Duan, Xiaoshuang
    Liu, Tao
    JOURNAL OF MATERIALS CHEMISTRY C, 2018, 6 (17) : 4727 - 4736
  • [10] Super resolution direct laser writing in ITX resist inspired by STED microscopy
    Yuan, Chenyu
    Liu, Jukun
    Jia, Tianqing
    Zhou, Kan
    Zhang, Hongxin
    Pan, Jia
    Feng, Donghai
    Sun, Zhenrong
    JOURNAL OF NONLINEAR OPTICAL PHYSICS & MATERIALS, 2014, 23 (02)
12345