INORGANIC RESIST FOR BILAYER APPLICATIONS

被引:0
|
作者
YOSHIKAWA, A [1 ]
UTSUGI, Y [1 ]
机构
[1] NIPPON TELEGRAPH & TEL PUBL CORP,ELECT COMMUN LAB,ATSUGI,KANAGAWA 24301,JAPAN
关键词
D O I
暂无
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
引用
收藏
页码:155 / PMSE
相关论文
共 50 条
  • [1] INORGANIC RESIST FOR BILAYER APPLICATIONS
    YOSHIKAWA, A
    UTSUGI, Y
    ACS SYMPOSIUM SERIES, 1987, 346 : 309 - 316
  • [2] INORGANIC RESIST PHENOMENA AND THEIR APPLICATIONS TO PROJECTION LITHOGRAPHY
    LEUNG, WY
    NEUREUTHER, AR
    OLDHAM, WG
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1986, 33 (02) : 173 - 181
  • [3] INORGANIC RESIST FOR DRY PROCESSING AND DOPANT APPLICATIONS
    CHANG, MS
    HOU, TW
    CHEN, JT
    KOLWICZ, KD
    ZEMEL, JN
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1973 - 1976
  • [4] INORGANIC RESIST PHENOMENA AND THEIR APPLICATIONS TO PROJECTION LITHOGRAPHY.
    Leung, Wingyu
    Neureuther, Andrew R.
    Oldham, William G.
    IEEE Transactions on Electron Devices, 1986, ED-33 (02) : 173 - 181
  • [5] Holographic applications of As-S-Se inorganic resist
    Kostyukevich, SA
    Vlcek, M
    Moskalenko, NL
    Shepeliavi, PE
    Stronski, AV
    Svechnikov, SV
    Venger, EF
    FIFTH INTERNATIONAL CONFERENCE ON CORRELATION OPTICS, 2001, 4607 : 184 - 188
  • [6] From microchannels to nanochannels in a bilayer resist
    Ocola, LE
    Stein, A
    NANOFABRICATION: TECHNOLOGIES, DEVICES AND APPLICATIONS, 2004, 5592 : 421 - 426
  • [7] Encapsulated inorganic resist technology
    Fedynyshyn, TH
    Doran, SP
    Lind, ML
    Sondi, I
    Matijevic, E
    ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVII, PTS 1 AND 2, 2000, 3999 : 627 - 637
  • [8] NEW SILYLATION BILAYER RESIST SYSTEM EMPLOYING PHOTOCHEMICAL SELECTIVE RESIST SILYLATION
    MIMURA, Y
    KOTAKA, I
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1994, 33 (6A): : 3640 - 3647
  • [9] BILAYER RESIST PROCESS FOR SUBMICRON OPTICAL LITHOGRAPHY USING SILICON CONTAINING RESIST
    MARTIN, B
    MICROELECTRONIC ENGINEERING, 1992, 17 (1-4) : 295 - 298
  • [10] A TOTALLY AQUEOUS DEVELOPABLE BILAYER RESIST SYSTEM
    DEGRANDPRE, MP
    VIDUSEK, DA
    LEGENZA, MW
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1985, 539 : 103 - 114