PROCESSING OF INSULATORS WITH ION-BEAMS

被引:0
|
作者
TOWNSEND, PD
机构
来源
GLASS TECHNOLOGY | 1991年 / 32卷 / 01期
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暂无
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
By control of the ion energy an ion beam may be used to sputter material from a surface, change stoichiometry, implant impurity ions, or introduce defects. This method of control of surface properties and topography for insulators has not been widely exploited. Existing literature presents examples from a limited range of crystals and glasses and an even more restricted set of commercial applications. However the potential uses are manifold and, for economic reasons, are likely first to appear in devices for optoelectronics and waveguide lasers. Potential and current progress in ion beam modification of the surfaces of insulators is discussed.
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页码:16 / 19
页数:4
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