INCIDENCE ANGLE DEPENDENCE OF PLANAR CHANNELING IN BORON ION-IMPLANTATION INTO SILICON

被引：13
|
作者：
MIYAKE, M
YOSHIZAWA, M
HARADA, H
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1983年 / 130卷 / 03期
关键词：
D O I：
10.1149/1.2119789
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：716 / 719
页数：4
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