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NONSTATIONARY PEELING APPARATUS
被引:4
|作者:
OBORI, H
TAKENAGA, M
ABDULLA, A
NAKAMURA, A
机构:
[1] SCI UNIV TOKYO,FAC SCI,DEPT APPL PHYS,1-3 KAGURAZAKA,TOKYO 162,JAPAN
[2] TERAOKA SEISAKUSYO CO LTD,DEPT PROD & TECHNOL,TOKYO 140,JAPAN
关键词:
D O I:
10.1002/app.1994.070530802
中图分类号:
O63 [高分子化学(高聚物)];
学科分类号:
070305 ;
080501 ;
081704 ;
摘要:
A piece of apparatus for measuring the peel adhesion behavior of pressure-sensitive adhesive tapes was developed. The apparatus allows peel rates to be varied as any functions of time or peel distance. In a cycle run of the accelerating and decelerating peel processes, nonstationary peeling was investigated over a wide range of peel rates using relatively short-length samples. The resultant behavior in nonstationary peeling indicated that in the interfacial failure regime, a good agreement with the normal stationary peeling can be obtained. This nonstationary peeling apparatus is expected to be useful for evaluation of peel adhesion. (C) 1994 John Wiley & Sons, Inc.
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页码:993 / 998
页数:6
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