THE ELECTROSTATIC POTENTIALS IN AN ELECTRON-CYCLOTRON-RESONANCE PROCESSING PLASMA

被引：2
|
作者：
ASHTIANI, KA [1 ]
SHOHET, JL [1 ]
ANDERSON, FSB [1 ]
ANDERSON, DT [1 ]
FRIEDMANN, JB [1 ]
机构：
[1] UNIV WISCONSIN,TORSATRON STELLARATOR LAB,MADISON,WI 53706
来源：
PLASMA CHEMISTRY AND PLASMA PROCESSING | 1992年 / 12卷 / 02期
关键词：
ELECTROSTATIC POTENTIALS; ELECTRON-CYCLOTRON RESONANCE; MAGNETIC MIRROR; EMISSIVE PROBES;
D O I：
10.1007/BF01447444
中图分类号：
TQ [化学工业];
学科分类号：
0817 ;
摘要：
The axial distribution of the electrostatic potentials of an electron-cyclotron resonance (ECR) processing plasma confined in a dc magnetic mirror geometry was characterized. The potential profiles for argon and helium at 8.0 x 10(-4) and 4.0 x 10(-4) Torr were measured using electron emissive probes. The experimental measurements were then compared with the predictions of a one-dimensional, electrostatic, particle-in-cell computer code which runs on a personal computer. The potential profiles as predicted by the code showed good agreement with the experimental measurements.
引用
收藏
页码：161 / 175
页数：15
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