PRESSURE AND TEMPERATURE INFLUENCE ON CDTE THIN-FILM DEPOSIT BY CLOSE-SPACED VAPOR TRANSPORT TECHNIQUE

被引：10
|
作者：
SOSA, V
CASTRO, R
PENA, JL
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1990年 / 8卷 / 02期
关键词：
D O I：
10.1116/1.576907
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：979 / 983
页数：5
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