ION-IMPLANTATION OF SI AND SE DONORS IN IN0.53GA0.47AS

被引：30
|
作者：
PENNA, T
TELL, B
LIAO, ASH
BRIDGES, TJ
BURKHARDT, G
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1985年 / 57卷 / 02期
关键词：
D O I：
10.1063/1.334813
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：351 / 354
页数：4
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