ELECTRICAL AND OPTICAL-PROPERTIES OF MOSE2 FILMS PREPARED BY RF MAGNETRON SPUTTERING

被引：0
|
作者：
BICHSEL, R [1 ]
LEVY, F [1 ]
机构：
[1] ECOLE POLYTECH FED LAUSANNE,INST PHYS APPL,CH-1015 LAUSANNE,SWITZERLAND
来源：
HELVETICA PHYSICA ACTA | 1984年 / 57卷 / 06期
关键词：
D O I：
暂无
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
收藏
页码：764 / 765
页数：2
相关论文
共 50 条
  • [41] Optical, structural and electrical properties of tin oxide films prepared by magnetron sputtering
    Karapatnitski, IA
    Mit', KA
    Mukhamedshina, DM
    Beisenkhanov, NB
    [J]. SURFACE & COATINGS TECHNOLOGY, 2002, 151 : 76 - 81
  • [42] THE EFFECTS OF ZINC DIFFUSION ON THE ELECTRICAL AND OPTICAL-PROPERTIES OF ZNO-AL FILMS PREPARED BY RF REACTIVE SPUTTERING
    IGASAKI, Y
    SAITO, H
    [J]. THIN SOLID FILMS, 1991, 199 (02) : 223 - 230
  • [43] Structural and optical properties of yttrium trioxide thin films prepared by RF magnetron sputtering
    Yan, F.
    Liu, Z. T.
    Liu, W. T.
    [J]. VACUUM, 2011, 86 (01) : 72 - 77
  • [44] Study on Optical Properties of Silicon Oxycarbide Thin Films Prepared by RF Magnetron Sputtering
    Chen, Tao
    Wang, Duoshu
    [J]. ADVANCED COMPOSITE MATERIALS, PTS 1-3, 2012, 482-484 : 1307 - 1312
  • [45] Effect of RF power and sputtering pressure on the structural and optical properties of TiO2 thin films prepared by RF magnetron sputtering
    Nair, Prabitha B.
    Justinvictor, V. B.
    Daniel, Georgi P.
    Joy, K.
    Ramakrishnan, V.
    Thomas, P. V.
    [J]. APPLIED SURFACE SCIENCE, 2011, 257 (24) : 10869 - 10875
  • [46] MAGNETO-OPTICAL PROPERTIES OF PtMnSb FILMS PREPARED BY RF MAGNETRON SPUTTERING.
    Shouji, M.
    Nagai, A.
    Murayama, N.
    Obi, Y.
    Fujimori, H.
    [J]. IEEE translation journal on magnetics in Japan, 1985, TJMJ-2 (04): : 381 - 382
  • [47] The properties of gallium phosphide films prepared by RF magnetron sputtering
    Song, JQ
    Liu, ZT
    Guo, DG
    Yu, ZQ
    Gng, DS
    Zheng, XL
    [J]. FOURTH INTERNATIONAL CONFERENCE ON THIN FILM PHYSICS AND APPLICATIONS, 2000, 4086 : 104 - 107
  • [48] Optical properties of In2O3 thin films prepared by rf helicon magnetron sputtering
    Miao, L.
    Tanemura, S.
    Cao, Y. G.
    Xu, G.
    [J]. PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 6, SUPPL 1, 2009, 6 : S123 - S126
  • [49] Microstructural evolution and optical properties of doped TiO2 films prepared by RF magnetron sputtering
    Wang, SF
    Hsu, YF
    Lee, YS
    [J]. CERAMICS INTERNATIONAL, 2006, 32 (02) : 121 - 125
  • [50] Structural and optical properties of TiO2 films prepared using reactive RF magnetron sputtering
    Jeong, SH
    Kim, BS
    Lee, BT
    Park, HR
    Kim, JK
    [J]. JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2002, 41 (01) : 67 - 71
12345