REACTIVE ION ETCHING RESISTANT NEGATIVE RESISTS FOR ION-BEAM LITHOGRAPHY

被引：4

|

作者：

WADA, Y

MOCHIJI, K

OBAYASHI, H

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1983年 / 130卷 / 01期

关键词：

D O I：

10.1149/1.2119654

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：187 / 190

页数：4

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