THE PHYSICAL-PROPERTIES OF LPCVD SI-N FILMS

被引：0
|
作者：
PAN, P [1 ]
ASSUR, I [1 ]
BERRY, W [1 ]
BURTON, S [1 ]
机构：
[1] IBM CORP,DIV GEN TECHNOL,ESSEX JUNCTION,VT 05452
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1983年 / 130卷 / 03期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
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页码：C78 / C78
页数：1
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