INTERFACIAL FRICTION OF SUBMONOLAYER HELIUM FILMS ADSORBED ON THE SURFACE OF GRAPHITE

被引:26
|
作者
MOHANDAS, P
LUSHER, CP
MIKHEEV, VA
COWAN, B
SAUNDERS, J
机构
[1] Department of Physics, Royal Holloway University of London, Egham, TW20 OEX, Surrey
关键词
D O I
10.1007/BF00753341
中图分类号
O59 [应用物理学];
学科分类号
摘要
The frictional coupling between an adsorbed helium film and the surface of graphite has been studied using torsional oscillator methods and exfoliated graphite as a substrate, in the temperature range 50mK to 2K. The observed period shift is consistent with the film decoupling from the substrate as the temperature is reduced, and is accompanied by a maximum in dissipation. Ar coverages below registry and in the incommensurate solid region the data are well described by Debye relations with a thermally activated relaxation time. This would correspond to a vanishing of the interfacial friction for the solid monolayer as T --> 0. At coverages between 0.064 Angstrom(-2) and 0.08 Angstrom(-2) a double peaked structure in the dissipation is observed. The results relate to the work of Krim et al.(l) who have used a quartz microbalance to study the ''nanotribology'' of adsorbed monolayers. In the present work the use of the graphite substrate offers the possibility of studying these effects on a system with a rich and well characterised submonolayer phase diagram.
引用
收藏
页码:481 / 488
页数:8
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