STRONG K-ALPHA EMISSION IN PICOSECOND LASER-PLASMA INTERACTIONS

被引:47
|
作者
SOOM, B
CHEN, H
FISHER, Y
MEYERHOFER, DD
机构
[1] UNIV ROCHESTER,DEPT PHYS & ASTRON,ROCHESTER,NY 14623
[2] UNIV ROCHESTER,DEPT MECH ENGN,ROCHESTER,NY 14623
关键词
D O I
10.1063/1.354240
中图分类号
O59 [应用物理学];
学科分类号
摘要
Kalpha emission is observed from the interaction of a picosecond, 1.05 mum laser pulse at 4 X 10(15) W/cm2 with a silicon target coated with various thicknesses of aluminum. Strong Kalpha emission requires a p-polarized, high-intensity-contrast laser pulse. At 7.1 angstrom, the Kalpha yield is 1.5 X 10(8) photons/sr with a duration of emission of less-than-or-equal-to 8 ps and a source area of 1.6 X 10(-6) cm2. The radiance is greater-than-or-equal-to 3 X 10(9) W/cm2 sr. Monte Carlo simulations have suggested that under these conditions Kalpha emission is a promising candidate for an efficient, ultra-short-duration x-ray source at approximately 1.5 angstrom.
引用
收藏
页码:5372 / 5377
页数:6
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