RAMAN-SPECTROSCOPY OF REACTIVE ION ETCHING INDUCED SUBSURFACE DAMAGE

被引：39
|
作者：
TSANG, JC
OEHRLEIN, GS
HALLER, I
CUSTER, JS
机构：
来源：
APPLIED PHYSICS LETTERS | 1985年 / 46卷 / 06期
关键词：
D O I：
10.1063/1.95549
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：589 / 591
页数：3
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