USE OF ANTIREFLECTIVE COATING IN BILAYER RESIST PROCESS

被引：14
|
作者：
LIN, YC
JONES, S
FULLER, G
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1983年 / 1卷 / 04期
关键词：
D O I：
10.1116/1.582749
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
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页码：1215 / 1218
页数：4
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