PERFORMANCE OF X-RAY AND ELECTRON SENSITIVE POSITIVE RESISTS IN MICROLITHOGRAPHY

被引：0
|
作者：
SERRE, B
SCHUE, F
ERANIAN, A
DATAMANTI, E
DUBOIS, JC
MONTGINOUL, C
GIRAL, L
机构：
[1] THOMSON CSF,CENT RES LAB,F-91401 ORSAY,FRANCE
[2] UNIV MONTPELLIER 2,PHOTOSYNTH LAB,F-34060 MONTPELLIER,FRANCE
来源：
REVUE DE PHYSIQUE APPLIQUEE | 1985年 / 20卷 / 02期
关键词：
D O I：
10.1051/rphysap:0198500200207700
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：77 / 86
页数：10
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