GAAS AND GAALAS REACTIVE ION ETCHING IN BCL3-CL2 MIXTURE

被引：15
|
作者：
TAMURA, H
KURIHARA, H
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1984年 / 23卷 / 09期
关键词：
D O I：
10.1143/JJAP.23.L731
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：L731 / L733
页数：3
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