PLASMA-ETCHING OF SIO2-FILMS FOR CONTACT HOLES IN VLSI

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作者：

ALBIN, S

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GEC JOURNAL OF RESEARCH | 1983年 / 1卷 / 03期

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TM [电工技术]; TN [电子技术、通信技术];

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0808 ; 0809 ;

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页码：178 / 183

页数：6

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