共 50 条
- [21] Study of loading effect during electron-beam exposure and etching process in photomask fabrication Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1999, 38 (12 B): : 6981 - 6984
- [24] F-2(+)-CENTER CREATION AND DESTRUCTION IN LIF CRYSTALS IN IMPULSIVE IRRADIATION BY DENSE ELECTRON-BEAM FIZIKA TVERDOGO TELA, 1981, 23 (06): : 1869 - 1871
- [25] DISLOCATION-STRUCTURE OF TUNGSTEN SINGLE-CRYSTALS GROWN BY ELECTRON-BEAM ZONE-MELTING PHYSICS OF METALS AND METALLOGRAPHY, 1972, 34 (04): : 166 - 171
- [26] Analytic study of exposure contrast over feature edge in electron-beam lithography JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2023, 41 (06):
- [27] Local line edge roughness in microphotonic devices: An electron-beam lithography study JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2007, 25 (01): : 235 - 241
- [28] STUDY OF BENDING DEFORMATIONS OF PLATES DURING ELECTRON-BEAM WELDING AUTOMATIC WELDING USSR, 1973, 26 (06): : 16 - 17
- [29] STUDY OF ELECTRON-BEAM MODULATORS OF LIGHT ON CRYSTALS OF 42 M-TYPE RADIOTEKHNIKA I ELEKTRONIKA, 1973, 18 (10): : 2205 - 2208