CRYSTALLIZATION OF AS-IMPLANTED LPCVD AMORPHOUS SI FILMS USING RAPID THERMAL ANNEALING

被引：0
|
作者：
ALVI, NS
KWOR, R
TANG, SM
机构：
[1] DELCO ELECTR,KOKOMO,IN 46902
[2] UNIV NOTRE DAME,DEPT ELECT & COMP ENGN,NOTRE DAME,IN 46556
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1986年 / 133卷 / 08期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
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页码：C330 / C330
页数：1
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