A FORMULA FOR THE CONCENTRATION PROFILE OF A BURIED LAYER WITH BACK DIFFUSION

被引：0
|
作者：
SHIER, JS
机构：
来源：
IEEE TRANSACTIONS ON ELECTRON DEVICES | 1985年 / 32卷 / 06期
关键词：
D O I：
10.1109/T-ED.1985.22088
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
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页码：1142 / 1143
页数：2
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