EVALUATION OF PHOTOMASK-PHOTORESIST METHOD OF CRYOTRON THIN-FILM FABRICATION

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作者：
PRITCHARD, JP
PIERCE, JT
SLAY, BG
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来源：
TRANSACTIONS OF THE METALLURGICAL SOCIETY OF AIME | 1966年 / 236卷 / 03期
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TF [冶金工业];
学科分类号：
0806 ;
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页码：359 / +
页数：1
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