CURRENT-VOLTAGE CHARACTERISTICS OF ION-IMPLANTED METAL-SEMICONDUCTOR FIELD-EFFECT TRANSISTOR

被引：2

|

作者：

KWONG, DL

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1985年 / 57卷 / 10期

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D O I：

10.1063/1.335345

中图分类号：

O59 [应用物理学];

学科分类号：

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页码：4798 / 4802

页数：5

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