CURRENT-VOLTAGE CHARACTERISTICS OF ION-IMPLANTED METAL-SEMICONDUCTOR FIELD-EFFECT TRANSISTOR

被引：2
|
作者：
KWONG, DL
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1985年 / 57卷 / 10期
关键词：
D O I：
10.1063/1.335345
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：4798 / 4802
页数：5
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