APPLICATION OF FUSION HIGH-POWER RF TECHNIQUES TO THE NON-FUSION FIELD

被引:0
|
作者
WILHELM, R
机构
[1] Max-Planck-Inst. fur Plasmaphys., Garching
关键词
RF-PLASMA SOURCES; MICROWAVE-PLASMA SOURCES; ECRH-PLASMA SOURCES; PLASMA PROCESSING;
D O I
10.1088/0741-3335/35/SA/012
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
The paper presents examples of high-power RF applications covering a frequency range of a few MHz up to microwave frequencies of several GHz. All examples refer to the RF generation of non-fusion plasmas meanwhile in use for many important technical processes. Some specific items axe: Inductively driven RF discharge for ion beam extraction (for space propulsion, ion surface treatment and ion implantation), RF-plate reactor (for etching and thin-film deposition in microelectronics), and newely developed microwave plasma sources (ECH discharges for large-area coatings of up to 200 m2/h, or for internal coating of pipes.
引用
收藏
页码:A199 / A210
页数:12
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