PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF SILICON EPITAXIAL LAYERS

被引：6

|

作者：

REIF, R

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1984年 / 131卷 / 10期

关键词：

D O I：

10.1149/1.2115310

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

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页码：2430 / 2435

页数：6

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